ENOVIA

Webinar: ROI Impact Analysis of ENOVIA Synchronicity DesignSync Data Manager

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Date: Available for Replay
Length:1 hour

Design Collaboration & Management Solutions Control Costs, Encourage IP Reuse, and Manage Increased Complexity

Meeting the challenges in getting Semiconductor products to market does not always require upgrading design tools or making expensive technology investments. Many of the leading Semiconductor companies have seen where they have been able to increase productivity through the use of design collaboration and more standardized design management within their flows.

Please join ENOVIA for a 1-hour webcast. This webcast, hosted by the Gantry Group, LLC will present the results of an objective survey of a group of long-term customers to identify the key benefits, value drivers, and percent improvements realized after deployment of ENOVIA Synchronicity DesignSync Data Manager.

The study revealed that ENOVIA Synchronicity DesignSync Data Manager is defining the Design Release Management process standard and is seen as an invaluable tool for:

  • Maintaining competitive advantage
  • Enabling increased use of hierarchical design and IP re-use
  • Controlling costs, reducing risk
  • Enabling multi-site/multi-enterprise design (e.g. complexity)
  • Speeding up development
  • Improving customer satisfaction

This webinar is targeted at decision makers concerned with increasing design efficiency, collaboration and improving IC product margins while reducing costs.

This study was completed by Gantry Group LLC on behalf of ENOVIA Corp in August 2008, and is based on interviews with 18 customers who have deployed ENOVIA Synchronicity DesignSync Data Manager.

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