11th Annual Advanced Reticle Symposium -
The Business of Advanced Photomasks
When: June 28, 2005
Where: San Jose Convention Center, San Jose, CA Meeting Room J
"Yield By Design: 40 Years of Moore's Law"
As we reflect on the 40th anniversary of Moore's law, this year's ARS will address the the state of semiconductor technology advancement and its impact not only economic growth but on society worldwide.
Plenary Session Speakers:
The Advanced Reticle Symposium, now in its eleventh year, has become the world's only forum dedicated to the discussion of the "tech-onomics" of advanced photomasks. This one day forum draws the unique combination of executives, engineering managers, technologists and key decision makers from leading design, equipment, fab and fabless semiconductor, software and photomask companies together to explore the photomask industry from all perspectives. Each of our Plenary Session Speakers will bring their unique perspective on key business and technical issues facing our industry.
- Rick Cassidy, President, TSMC NA
- Dan Hutcheson, CEO, VLSI Research
- Chris A. Malachowsky, Co-Founder, NVIDIA Fellow and Senior Vice President of Engineering and Operations
The Advanced Reticle Symposium has been the origin of industry opinion, data and initiatives. Attend this years Advanced Reticle Symposium as we discuss Yield by Design: 40 Years of Moore's Law and voice your perspective on how it impacts:
Register NOW for $25 Admission and SAVE $125. Registration goes to $150 after June 24, 2005. Don't miss this opportunity to save!
- Value Chain Optimization
- Technology and business challenges for sub-90nm Production
- Exponential growth in data volumes
- Verification strategies
To register TODAY please visit: http://www.synopsys.com/ars