GLOBALFOUNDRIES and Mentor Graphics Extend Collaboration to Third Generation of DFM

WILSONVILLE, Ore. — (BUSINESS WIRE) — August 26, 2011Mentor Graphics Corporation (NASDAQ: MENT) today announced new capabilities in its design to silicon solutions that support GLOBALFOUNDRIES’ third generation of signoff-ready design enablement for leading edge IC manufacturing. New technologies support GLOBALFOUNDRIES’ manufacturing analysis and scoring (MAS) methodology, which is implemented using the Calibre® platform’s critical feature analysis (CFA), and can be used to optimize IP blocks and SoCs at all layers to help reduce the manufacturing variability of SoC products.

The Calibre platform also supports GLOBALFOUNDRIES’ DRC+ pattern-based design rule checking technology, which identifies potential yield-limiting litho patterns while maintaining significant performance improvement over full litho simulation approaches. Other advances included in the third-generation DFM offering are new Calibre LFD™ kits for 28nm and 20nm, improved CMP models for 28nm, and improved interaction with place and route tools (such as the Mentor® Olympus-SoC™ tool) and other design flows to prevent late-stage signoff violations.

“The beauty of the Mentor solution is that it provides a single, consistent environment for managing the interface between designers and the fab throughout the life cycle of a manufacturing process node,” said Andy Brotman, vice president, Design Infrastructure, GLOBALFOUNDRIES. “Foundries use Calibre early in technology development to validate new process design rules, and to determine the specific patterns that require tighter design rule constraints. In the case of GLOBALFOUNDRIES, these rules and patterns are then transferred to our mutual customers in the form of DRC+ decks that integrate rules and patterns into a consistent, high performance verification environment. GLOBALFOUNDRIES MAS scoring methodology, based on Calibre CFA, in conjunction with the rest of the Calibre DFM platform, assures that third-party IP certified by GLOBALFOUNDRIES is resistant to manufacturing variability. Likewise, the same platform allows customers to evaluate the IP they develop themselves for their designs, reducing the risk of late stage problems that can lead to late products or slower than expected yield ramps.”

“There are many innovations needed in the design-to-fab interface to maintain the momentum of IC scaling,” said Michael Buehler-Garcia, director of Calibre Design Solutions Marketing. “We’ve been working with the GLOBALFOUNDRIES ecosystem, including AMD, since the first Calibre product was introduced, and this collaboration continues to be stronger than ever. Today, we’re working not only to improve the precision of existing design, DFM, and verification tools as we move from one node to the next, but also to provide a seamless solution that can support customers from early stage technology evaluation through mature production as many designs are brought to market at a given node.”

Beyond just the design flow, Mentor and GLOBALFOUNDRIES are innovating to make data captured in the test process more useful to product engineers and designers as they debug existing designs and introduce new designs in the same process node. These changes have the potential to accelerate the pace at which a given node can be brought to maturity, and to help ensure overall yield and profitability.

Mentor and GLOBALFOUNDRIES will be demonstrating and speaking about the next-generation DFM joint offering at the Global Technology Conference being held at the Santa Clara Convention Center on August 30, 2011.

About Mentor Graphics

Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $915 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site:

(Mentor Graphics, Mentor and Calibre are registered trademarks and LFD and Olympus-SoC are trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)


Mentor Graphics
Gene Forte, 503-685-1193
Email Contact
Sonia Harrison, 503-685-1165
Email Contact

Review Article Be the first to review this article

 Advanced Asembly

Featured Video
Latest Blog Posts
Bob Smith, Executive DirectorBridging the Frontier
by Bob Smith, Executive Director
You’re Invited! CEO Outlook May 18
Anupam BakshiAgnisys Automation Review
by Anupam Bakshi
Automating the UVM Register Abstraction Layer (RAL)
Electronics Engineer for Lockheed Martin at Sunnyvale, California
Pre-silicon Design Verification Engineer for Intel at Santa Clara, California
Principle Engineer (Analog-Mixed-Signal Implementation) for Global Foundaries at Santa Clara, California
Senior HID Sensor Algorithm Architect for Apple Inc at Cupertino, California
ASIC SoC Verification Engineer for Ericsson at Austin, Texas
Technical Product Manager- SISW-EDA 238452 for Siemens AG at Fremont, California
Upcoming Events
DVCon China 2021 at Shanghai China - May 26, 2021
CadenceLIVE Americas 2021 at United States - Jun 8 - 9, 2021
DesignCon 2021 at San Jose McEnery Convention Center San Jose, CA San Jose CA - Aug 16 - 18, 2021
SEMICON Southeast Asia 2021 Hybrid Event at Setia SPICE Convention Centre Penang Malaysia - Aug 23 - 27, 2021

© 2021 Internet Business Systems, Inc.
670 Aberdeen Way, Milpitas, CA 95035
+1 (408) 882-6554 — Contact Us, or visit our other sites:
AECCafe - Architectural Design and Engineering TechJobsCafe - Technical Jobs and Resumes GISCafe - Geographical Information Services  MCADCafe - Mechanical Design and Engineering ShareCG - Share Computer Graphic (CG) Animation, 3D Art and 3D Models
  Privacy PolicyAdvertise